High speed electron beam lithography.

A Precision High - Speed Electron Beam Lithography System

A product of HP's research labs, it'llbe used in-house to make very-large-scale integrated circuits and other advanced devices. The column's field emission electron gun contributes fo fhe system's high speed. The pattern dataturns the electron beam on and off at rates as high as 300 MHz. Precision ts achieved by measuring disfortlons and correcting them with software and electronics. Digital Ad...

Dopant Driven Electron Beam Lithography

Introduction to Electron Beam Lithography

Electron Beam Lithography is a specialized technique for creating extremely fine patterns (~ 50 nm). Derived from the early scanning electron microscopes, the technique in brief consists of scanning a beam of electrons across a surface covered with a resist film sensitive to those electrons, thus depositing energy in the desired pattern in the resist film. The main attributes of the technology ...

Polystyrene negative resist for high-resolution electron beam lithography

We studied the exposure behavior of low molecular weight polystyrene as a negative tone electron beam lithography (EBL) resist, with the goal of finding the ultimate achievable resolution. It demonstrated fairly well-defined patterning of a 20-nm period line array and a 15-nm period dot array, which are the densest patterns ever achieved using organic EBL resists. Such dense patterns can be ach...

Fabrication of high-density nanostructures by electron beam lithography*

We demonstrate a fabrication method to define high-density, uniform nanostructures by electron beam lithography at conventional beam voltages ~,40 kV!. Here we optimize the exposure and development conditions needed to generate such nanostructure arrays using polymethylmethacrylate as positive resist and isopropyl alcohol as a developer. Arrays of 12 nm dots with 25 nm period and 20 nm lines wi...